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GRM1201 Multi-Stage Roots Dry Vacuum Pump 1200 m³/h Oil-Free for Semiconductor PECVD MOCVD

Name: GRM1201 Multi-Stage Roots Dry Vacuum Pump 1200 m³/h Oil-Free for Semiconductor PECVD MOCVD
Brand: Ningbo Baosi Energy Equipment Co., Ltd.
SKU: GRM1201
Price: 10,500.00 USD
Availability: InStock

Dettagli del prodotto:

Luogo di origine:	Cina
Marca:	Baosi
Certificazione:	CE
Numero di modello:	GRM1201

Informazioni dettagliate

Luogo di origine:

Cina

Marca:

Baosi

Certificazione:

Numero di modello:

GRM1201

Velocità di pompaggio:

1200 m3/h

Pressione estrema:

≤0,15 Pa

Potenza del motore:

1,9+1,9 kW

Voltaggio:

380 V/trifase

Ingresso:

ISO160

Presa:

KF25

Rumore:

≤63dB(A)

Peso:

260 kg

Dimensioni:

865×344×751 mm

Acqua di raffreddamento:

0,1-0,6 MPa, ≥4 l/min

Spurgo N2:

0,2-0,6 MPa, 12-50 l/min

Evidenziare:

High Light

Evidenziare:

high speed roots vacuum pump

1200m3h dry vacuum pump

PECVD MOCVD process vacuum

Informazioni di trading

Quantità di ordine minimo:

1 insieme

Prezzo:

USD 8500-12500/Set

Imballaggi particolari:

Imballaggio standard in cassa di legno per esportazione

Tempi di consegna:

15-30 giorni lavorativi

Termini di pagamento:

T/T, L/C

Capacità di alimentazione:

50 set/mese

Descrizione del prodotto

GRM1201 Multi-Stage Roots Dry Vacuum Pump 1200 m³/h Oil-Free High-Speed Vacuum Pump for Semiconductor PECVD MOCVD

GRM1201 Multi-Stage Roots Dry Vacuum Pump — 1200 m³/h High-Speed Solution

The GRM1201 is a high-speed multi-stage roots dry vacuum pump delivering 1200 m³/h pumping speed with ultimate pressure of ≤0.15 Pa. Sharing the same compact platform as the GRM601 (865 * 344 * 751 mm, 260 kg) but with ISO160 inlet for higher throughput, it excels in PECVD, MOCVD and demanding semiconductor clean and medium process applications.

Key Features

High-Speed Multi-Stage Roots: 1200 m³/h with low power consumption
Dual Motor Efficiency: 1.9+1.9 kW permanent magnet synchronous motors
Excellent Ultimate Pressure: ≤0.15 Pa meets demanding process requirements
Ultra-Quiet: ≤63 dB(A) — cleanroom-compatible noise level
Large ISO160 Inlet: Handles high gas throughput for production-scale applications
Oil-Free Clean Vacuum: No oil contamination for sensitive semiconductor processes
Superior Dust Handling: Advanced rotor design for particle-rich environments
Compact Platform: Same footprint as GRM601 — easy line integration
Triple Sealing System: Lip seal + labyrinth + nitrogen purge guarantee oil-free vacuum
Smart Connectivity: I/O and RS485 (Modbus) for remote factory integration

Technical Specifications

Model	GRM1201
Pumping Speed	1200 m³/h
Ultimate Pressure (w/o purge)	≤0.15 Pa
Motor Power	1.9 + 1.9 kW
Voltage	380V (3-Phase)
Inlet Connection	ISO160
Outlet Connection	KF25
Noise Level	≤63 dB(A)
Weight	260 kg
Dimensions (LWH)	865 * 344 * 751 mm
Cooling Water Pressure	0.1–0.6 MPa
Cooling Water Flow	≥4 L/min
N₂ Purge Pressure	0.2–0.6 MPa
N₂ Purge Flow	12–50 L/min
Operating Temperature	5–40°C; ≤90% RH

Applications

Semiconductor: PECVD, MOCVD, SACVD, RTP, HDP-CVD, ALD, Metal Etch, Silicon Etch
Photovoltaic: High-throughput solar cell manufacturing lines
Lithium Battery: Production-scale cell drying and electrolyte processing
Flat Panel Display: OLED and LCD manufacturing

Tag:

GRM1201 Multi-Stage Roots Dry Vacuum Pump 1200 m³/h Oil-Free for Semiconductor PECVD MOCVD

High Light

Evidenziare:

high speed roots vacuum pump

1200m3h dry vacuum pump

PECVD MOCVD process vacuum

pompa per vuoto a turbina,

Pompa ad alto vuoto,

high speed roots vacuum pump

Pompa a vuoto secco raffreddata ad acqua 1200m3/h,≤ 0,15Pa,1.9kw, GRM1201

Pompa a vuoto a secco raffreddata ad acqua 200m³/h, ≤0.5Pa, 1.9kw, GRM201

Pompa a vuoto a secco raffreddata ad acqua 600m³/h, ≤0,15Pa, 1,9kW, GRM601